Equation icon  Laser exposure

 
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Resource type: Equation
Description: In the rapid prototyping process stereolithography (SLA), the resin cures when exposed to energies above a critical exposure. The above equation describes the exposure on the surface of and within the resin for a laser beam of power PL moving at a velocity Vs.

TeX format: {E_{(r,z)} = \sqrt{\frac{2}{\pi}} \left [\frac{P_L}{W_0 V_s} \right ] \cdot exp^{-\left (\frac{z}{D_p}-\frac{2r^2}{{W_0}^2} \right )}}

E(r,z) {E_{(r,z)}} = laser exposure at depth z and distance r from the beam centre (J.m-2) {J.m^{-2}}
P {P} = beam power (W) {W}
W0 {W_0} = effective beam radius (m) {m}
Vs {V_s} = scan velocity of beam (m.s-1) {m.s^{-1}}
z {z} = depth below resin surface (m) {m}
Dp {D_p} = beam penetration depth (when irradiance = 37% of the surface irradiance) (m) {m}
r {r} = radius from centre of beam (m) {m}

Keywords: rapid prototyping • energy • irradiance • density • manufacturing • Beer-Lambert • absorption • processing • laser • beam • sintering • melting • cutting • SLM • SLS • SLA • spot size
Categories: Science approaches
Processes > Shaping > Machining
Processes > Shaping > Powder methods
Processes > Shaping > Rapid prototyping
Processes > Surface treatments > Heat treatments
Processes > Thermal treatments > Sintering
Applications > Manufacturing & industry
Properties > Electrical, magnetic & optical > Optical
Created by: The University of Liverpool
License: This resource is released under the Creative Commons Attribution license (2.0 UK: England & Wales).
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Date created: 18 August 2010
Date added: 14 September 2010
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Resource ID: 3218