Image icon  PVD chamber

 
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Description: This is a schematic image of a PVD (physical vapor deposition) chamber. PVD processes involve depositing a source material (which can either be from a solid, liquid or gas) onto the surface of the component. There may be a chemical reaction between the substrate and the coating material. One of the attractions of PVD methods is that the substrate can be at relatively low temperatures (in the range 50–500°C)
Keywords: PVD • physical vapour deposition • coating • surface modification
Categories: Processes > Shaping
Processes > Shaping > Deposition
Processes > Surface treatments > Surface coatings
Created by: The Open University
Published by: The Open University
License: This resource is released under the Creative Commons Attribution Non-Commercial Share Alike license (2.0 UK: England & Wales).
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Date created: 09 August 2010
Date added: 13 December 2010
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Resource ID: 3282