Presentation icon  Nanomanufacturing: Semiconductor Manufacturing

 
Use this resource: Use this resource icon
Link to this page: http://core.materials.ac.uk/search/detail.php?id=3368
View at:    
Resource type: Presentation
Description:

Nanomanufacturing 1: Semiconductor manufacturing

    Topics:
  • From Si crystals to Wafers
  • From Wafers to Chips
  • Photolithography: Definitions
  • Optical Lithography
  • Multi-Photon Lithography
  • E-Beam Lithography
  • Imprinting Lithography
  • Scanning probe lithography
  • Additive Processes
  • Thermal Oxidation
  • Diffusion
  • Thermal Evaporation
  • Evaporation: Shadowing
  • Planetary Evaporator
  • Subtractive Process
  • Etching
  • Etch Selectivity
  • Anisotropic Wet Etching
  • Dry Etching Profiles
  • Process Flow
  • Processing Steps in Final Packaging
  • Yield issue in processing

Keywords: nanomanufacture • semiconductor • lithography • wafers • chips • evaporation • etching • processing • surface treatment • e-beam • presentation
Categories: Materials > Ceramics & glasses > Technical ceramics > Carbon and graphite
Processes > Surface treatments > Heat treatments
Processes > Surface treatments > Painting and printing
Processes > Surface treatments > Polishing, etching, working, texturing, cleaning
Properties > Electrical, magnetic & optical > Semiconductivity
Scale > Nano(-materials)
Created by: Nicholas X. Fang, University of Illinois at Urbana-Champaign
License: This resource is released under the Creative Commons Attribution Non-Commercial Share Alike license (3.0 Unported).
Creative Commons Attribution Non-Commercial Share Alike logo
You are free:
  • to share – to copy, distribute and transmit the work
  • to remix – to adapt the work
Under the following conditions:
  • attribution – You must attribute the work in the manner specified by the author or licensor (but not in any way that suggests that they endorse you or your use of the work).
  • noncommercial – You may not use this work for commercial purposes.
  • share alike – If you alter, transform, or build upon this work, you may distribute the resulting work only under the same or similar license to this one.
View the full legal code here.
Date created: 11 May 2009
Date added: 26 January 2011
Package:
Resource ID: 3368