Presentation icon  Nanomanufacturing: Optical Nanomanufacturing

Use this resource: Use this resource icon
Link to this page:
View at:    
Resource type: Presentation

Nanomanufacturing 2: Optical Nanomanufacturing

  • Three Basic Exposure Methods
  • Photomask and Reticles
  • Positive and Negative Lithography
  • Relationshilp Between Mask and Resist
  • Eight Steps to Photolithography
  • Photolithographic Process
  • Positive Photoresists
  • Negative Photoresists
  • Chemistry of Photo-crosslinking
  • A simplified model of Polymerization
  • PhotoResist Physical Properties
  • Resist Contrast
  • Geometric Optics
  • Fourier Analysis on Image Transfer
  • Modulation Transfer Function
  • The Impact of MTF
  • Wavefront Engineering Techniques
  • From Micro to Nano Stereolithography
  • Plasmon Enhanced Lithography
  • Interference Lithography
  • 3D Holographic Lithography

Keywords: optical • nanomanufacture • lithography • photomask • photolithography • photoresist • MTF • stereolithography • polymerization • Fourier analysis • presentation
Categories: Materials > Ceramics & glasses > Technical ceramics > Carbon and graphite
Processes > Surface treatments > Painting and printing
Properties > Electrical, magnetic & optical > Optical
Scale > Nano(-materials)
Created by: Nicholas X. Fang, University of Illinois at Urbana-Champaign
License: This resource is released under the Creative Commons Attribution Non-Commercial Share Alike license (3.0 Unported).
Creative Commons Attribution Non-Commercial Share Alike logo
You are free:
  • to share – to copy, distribute and transmit the work
  • to remix – to adapt the work
Under the following conditions:
  • attribution – You must attribute the work in the manner specified by the author or licensor (but not in any way that suggests that they endorse you or your use of the work).
  • noncommercial – You may not use this work for commercial purposes.
  • share alike – If you alter, transform, or build upon this work, you may distribute the resulting work only under the same or similar license to this one.
View the full legal code here.
Date created: 11 May 2009
Date added: 26 January 2011
Resource ID: 3369