Presentation icon  Nanomanufacturing: Optical Nanomanufacturing

 
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Resource type: Presentation
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Nanomanufacturing 2: Optical Nanomanufacturing

    Topics:
  • Three Basic Exposure Methods
  • Photomask and Reticles
  • Positive and Negative Lithography
  • Relationshilp Between Mask and Resist
  • Eight Steps to Photolithography
  • Photolithographic Process
  • Positive Photoresists
  • Negative Photoresists
  • Chemistry of Photo-crosslinking
  • A simplified model of Polymerization
  • PhotoResist Physical Properties
  • Resist Contrast
  • Geometric Optics
  • Fourier Analysis on Image Transfer
  • Modulation Transfer Function
  • The Impact of MTF
  • Wavefront Engineering Techniques
  • From Micro to Nano Stereolithography
  • Plasmon Enhanced Lithography
  • Interference Lithography
  • 3D Holographic Lithography

Keywords: optical • nanomanufacture • lithography • photomask • photolithography • photoresist • MTF • stereolithography • polymerization • Fourier analysis • presentation
Categories: Materials > Ceramics & glasses > Technical ceramics > Carbon and graphite
Processes > Surface treatments > Painting and printing
Properties > Electrical, magnetic & optical > Optical
Scale > Nano(-materials)
Created by: Nicholas X. Fang, University of Illinois at Urbana-Champaign
License: This resource is released under the Creative Commons Attribution Non-Commercial Share Alike license (3.0 Unported).
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Date created: 11 May 2009
Date added: 26 January 2011
Package:
Resource ID: 3369